Nova Measuring Instruments and optical process control
Seminar
Speaker
Dror Shafir
Date
25/03/2015 - 14:00Add to Calendar
2015-03-25 14:00:00
2015-03-25 14:00:00
Nova Measuring Instruments and optical process control
The manufacturing of nanometric scale semiconductor structures in the chip industry requires extremely tight non-demolition process control. Modern transistors are about 10 nm wide - orders of magnitude smaller than the resolution limits of optical microscopes. Still, it is possible to tell whether a transistor is an angstrom too wide or too narrow using optical metrology tools. I will introduce Nova’s technology and describe the methods by which we can very precisely follow the chip fabrication process in real time.
seminar room on the 9th floor of the Nanobuilding
Department of Physics
physics.dept@mail.biu.ac.il
Asia/Jerusalem
public
Place
seminar room on the 9th floor of the Nanobuilding
Abstract
The manufacturing of nanometric scale semiconductor structures in the chip industry requires extremely tight non-demolition process control. Modern transistors are about 10 nm wide - orders of magnitude smaller than the resolution limits of optical microscopes. Still, it is possible to tell whether a transistor is an angstrom too wide or too narrow using optical metrology tools. I will introduce Nova’s technology and describe the methods by which we can very precisely follow the chip fabrication process in real time.
Last Updated Date : 05/12/2022
